@article {16806,
	title = {Effects of annealing temperature and ITO intermediate thin-layer on electrical proprieties of Au/p-Si structure deposited by RF magnetron sputtering},
	journal = {Superlattices and Microstructures},
	volume = {128},
	year = {2019},
	pages = {382-391},
	url = {https://www.sciencedirect.com/science/article/abs/pii/S0749603618324765},
	author = {F.Djeffal and H. Ferhati and A. Benhaya and A. Bendjerad}
}
