Citation:
Ayache R, Bouabellou A, Richter R. Optical characterization of β-FeSi2 layers formed by ion beam synthesis. Materials Science in Semiconductor Processing [Internet]. 2004;7 (4-6) :463-466.
AYACHE Rachid
Professor in Applied Physics
Pharmacy Department - Faculty of Medicine
University of Batna 2, ALGERIA -- جامعة باتنة 2 -- الجزائر
Recent Publications
- Effect of Ion Implantation Temperature on Formation of Nanometric β-FeSi2 Layer
- Formation of Nanometric Yttrium Silicides Layers onto Si (111) Substrate by Ion Implantation
- Physique et Biophysique (Cours & Exercices Corrigés)
- Study of Nickel Silicide Formed by Ion Beam Mixing
- Ion Beam Synthesis of Cobalt Silicide Layers in Si(111)
- Study of Iron Silicide Formed by Ion Beam Mixing
