Citation:
Ayache R. Surface modification of Si(111) substrate by iron ion implantation: Growth of a thin ß- FeSi2 layer. Review of Scientific Instruments [Internet]. 2006;77 (3) :03C108-03C108-3.
AYACHE Rachid
Professor in Applied Physics
Pharmacy Department - Faculty of Medicine
University of Batna 2, ALGERIA -- جامعة باتنة 2 -- الجزائر
Recent Publications
- Effect of Ion Implantation Temperature on Formation of Nanometric β-FeSi2 Layer
- Formation of Nanometric Yttrium Silicides Layers onto Si (111) Substrate by Ion Implantation
- Physique et Biophysique (Cours & Exercices Corrigés)
- Study of Nickel Silicide Formed by Ion Beam Mixing
- Ion Beam Synthesis of Cobalt Silicide Layers in Si(111)
- Study of Iron Silicide Formed by Ion Beam Mixing
